ICRF Launcher for Reduction of Impurity Production Ohkawa, T. ; Hino, T. ; Andrews, P. L. ; Chan, V. S. ; Chiu, S. C. Abstract Publication: IEEE Transactions on Plasma Science Pub Date: December 1985 DOI: 10.1109/TPS.1985.4316474 Bibcode: 1985ITPS...13..563O