Random Deposition Model with a Constant Capture Length
Abstract
We introduce a sequential model for the deposition and aggregation of particles in the submonolayer regime. Once a particle has been randomly deposited on the substrate, it sticks to the closest atom or island within a distance ℓ, otherwise it sticks to the deposition site. We study this model both numerically and analytically in one dimension. A clear comprehension of its statistical properties is provided, thanks to capture equations and to the analysis of the island-island distance distribution.
- Publication:
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Progress of Theoretical Physics
- Pub Date:
- January 2005
- DOI:
- 10.1143/PTP.113.15
- arXiv:
- arXiv:cond-mat/0409048
- Bibcode:
- 2005PThPh.113...15P
- Keywords:
-
- Condensed Matter - Statistical Mechanics;
- Condensed Matter - Materials Science
- E-Print:
- 14 pages, minor corrections. Accepted for publication in Progress of Theoretical Physics