A Framework for Analyzing the Scalability of Ion Trap Geometries

A utility-scale trapped-ion quantum information processor will require millions of qubits controlled with fast and high-fidelity gates. Achievable ion number, gate speed, and gate fidelity are all influenced by the trapping field, which depends on the electrode geometry. Here we identify a set of key field-dependent figures of merit: harmonicity of the trapping potential, radial trapping frequency, and trap depth. We also consider fabrication requirements and the path towards integration of peripherals. We apply this framework to three types of traps: a standard surface trap, a surface trap with a grounded top wafer, and a trap with two stacked identical patterned wafers with cross-alignment of rf and dc electrodes. We determine that purely 2D surface traps lack the necessary field properties for large-scale quantum technologies due to their shallow trap depth and low harmonicity. Moving to 3D geometries will be essential to achieve higher radial confinement, better harmonicity, and therefore lower power dissipation. This framework can be applied to future work in designing and demonstrating scalable electrode geometries for trapped-ion quantum information processing.