Atomic-scale metastable structure formation in nickel-aluminum alloys synthesized far from equilibrium

This study reports a new meta-stable structure in epitaxial nickel-aluminum (Ni-Al) films (Al content up to 24.4 at.%) grown on MgO(001) substrates by magnetron sputtering. Structure probes by XRD, HRTEM and nano-indentation combined with atomistic simulations consistently demonstrate that in thin film samples with coexisting {\gamma} and {\gamma}' phases, domains of the two phases are homogeneously intermixed at the atomic-scale, forming a coherent matched lattice with one overall lattice parameter. It expands as aluminum (Al) concentration increases, with {\gamma} phase domains being progressively replaced by {\gamma}' phase domains. This behavior is similar to a solid solution, where the atomic-scale domain of the {\gamma} and {\gamma}' phases act as solute and solvent, respectively. Isothermal annealing and nanoindentation reveal that the structure decomposes into distinct {\gamma}' and {\gamma} phases due to the loss of lattice matching at 400 {\deg}C, resulting in an increase in hardness. This is followed by further relaxation and domain growth at higher temperatures (600 {\deg}C and 800 {\deg}C), accompanied by a decrease in hardness. These observations confirm the metastable nature of the nanoscale {\gamma} and {\gamma}' phases system, enhance the understanding of the Ni-Al alloy system and providing new insights for meta-stable intermetallic thin film synthesis.