Josephson Field Effect Transistors with InAs on Insulator and High Permittivity Gate Dielectrics

InAs on Insulator (InAsOI) has recently been demonstrated as a promising platform to develop hybrid semiconducting-superconducting electronics, which features an InAs epilayer grown onto a cryogenic insulating InAlAs metamorphic buffer. The miniaturization of Si microchips has progressed significantly due to the integration of high permittivity (high-k) gate insulators, compared to the conventional thermally-growth SiO2. Here, we investigate the gate-tunable electrical properties of InAsOI-based Josephson Field Effect Transistors (JoFETs) featuring different high-k gate insulators, namely, HfO2 and Al2O3. With both dielectrics, the JoFETs can entirely suppress the switching current and increase the normal state resistance by 10-20 times using negative gate voltages. The HfO2-JoFETs exhibit improved gate-tunable electrical performance compared to those achieved with Al2O3-JoFETs, which is related to the higher permittivity of the insulator. Gate-dependent electrical properties of InAsOI-based JoFETs were evaluated in the temperature range from 50 mK to 1 K. Moreover, under the influence of an out-of-plane magnetic field, JoFETs exhibited an unconventional Fraunhofer diffraction pattern.