Ultra-thin plasmonic detectors
Abstract
Plasmonic materials, and their ability to enable strong concentration of optical fields, have offered a tantalizing foundation for the demonstration of sub-diffraction-limit photonic devices. However, practical and scalable plasmonic optoelectronics for real world applications remain elusive. In this work, we present an infrared photodetector leveraging a device architecture consisting of a "designer" epitaxial plasmonic metal integrated with a quantum-engineered detector structure, all in a mature III-V semiconductor material system. Incident light is coupled into surface plasmon-polariton modes at the detector/designer metal interface, and the strong confinement of these modes allows for a sub-diffractive ( ∼ λ 0 / 33 ) detector absorber layer thickness, effectively decoupling the detector's absorption efficiency and dark current. We demonstrate high-performance detectors operating at non-cryogenic temperatures ( T = 195 K ), without sacrificing external quantum efficiency, and superior to well-established and commercially available detectors. This work provides a practical and scalable plasmonic optoelectronic device architecture with real world mid-infrared applications.
- Publication:
-
Optica
- Pub Date:
- December 2021
- DOI:
- 10.1364/OPTICA.438039
- arXiv:
- arXiv:2107.04143
- Bibcode:
- 2021Optic...8.1545N
- Keywords:
-
- Physics - Optics;
- Physics - Instrumentation and Detectors
- E-Print:
- doi:10.1364/OPTICA.438039