Optimization of quantum-dot qubit fabrication via machine learning
Abstract
Precise nanofabrication represents a critical challenge to developing semiconductor quantum-dot qubits for practical quantum computation. Here, we design and train a convolutional neural network to interpret scanning electron micrographs and quantify qualitative features affecting device functionality. The high-throughput strategy is exemplified by optimizing a model lithographic process within a five-dimensional design space and by demonstrating a robust approach to address lithographic proximity effects. The results emphasize the benefits of machine learning for developing stable processes, shortening development cycles, and enforcing quality control during qubit fabrication.
- Publication:
-
Applied Physics Letters
- Pub Date:
- May 2021
- DOI:
- 10.1063/5.0040967
- arXiv:
- arXiv:2012.08653
- Bibcode:
- 2021ApPhL.118t4001M
- Keywords:
-
- Quantum Physics;
- Condensed Matter - Mesoscale and Nanoscale Physics
- E-Print:
- Appl. Phys. Lett. 118, 204001 (2021)