Strain Relaxation via Phase Transformation in SrSnO3
Abstract
SrSnO3 (SSO) is an emerging ultra-wide bandgap (UWBG) semiconductor with potential for highpower applications. In-plane compressive strain was recently shown to stabilize the high temperature tetragonal phase of SSO at room temperature (RT) which exists at T > 1062 K in bulk. Here, we report on the study of strain relaxation in epitaxial, tetragonal phase of Nd-doped SSO films grown on GdScO3 (110) (GSO) substrates using radical-based hybrid molecular beam epitaxy. The thinnest SSO film (thickness, t = 12 nm) yielded a fully coherent tetragonal phase at RT. At 12 nm < t < 110 nm, the tetragonal phase first transformed into orthorhombic phase and then at t > 110 nm, the orthorhombic phase began to relax by forming misfit dislocations. Remarkably, the tetragonal phase remained fully coherent until it completely transformed into the orthorhombic phase. Using thickness- and temperature-dependent electronic transport measurements, we discuss the important roles of the surface, phase coexistence, and misfit dislocations on carrier density and mobility in Nd-doped SSO. This study provides unprecedented insights into the strain relaxation behavior and its consequences for electronic transport in doped SSO with implications in the development of high-power electronic devices.
- Publication:
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arXiv e-prints
- Pub Date:
- October 2020
- DOI:
- 10.48550/arXiv.2010.09817
- arXiv:
- arXiv:2010.09817
- Bibcode:
- 2020arXiv201009817T
- Keywords:
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- Condensed Matter - Materials Science
- E-Print:
- 19 pages, 4 figures