Carbon film in RF surface plasma source with cesiation

Deposition of carbon film in RF SPS is observed. It is assumed that persistent cesiation without continuous cesium injection in the Spallation Neutron Source RF Surface Plasma Source (SPS) is related to deposition of carbon film on the collar converter. The work function dependence for graphite with alkali deposition has no minimum typical for metals and semiconductors and the final work function is higher. For this reason, the probability of H- secondary emission from cesiated metal and semiconductors can be higher than from cesiated carbon films but the carbon film maintains cesiation longer and can operate with low cesium consumption.