The chemical potential and the work function of a metal film on a dielectric substrate
Abstract
The chemical potential and the work function of an aluminium metal film which is in the vacuum (1) and on a dielectric substrate (2) are obtained using the model of non-interacting electrons confined by an asymmetric rectangular potential well. For the first time, these two characteristics are calculated with correct taking into account the electroneutrality condition. As a result, the values of the chemical potential and the work function tend to their bulk values upon increasing the film thickness. The presence of a dielectric substrate leads to a small shift in the values of these characteristics.
- Publication:
-
Philosophical Magazine Letters
- Pub Date:
- January 2019
- DOI:
- 10.1080/09500839.2019.1605219
- arXiv:
- arXiv:1804.08884
- Bibcode:
- 2019PMagL..99...12K
- Keywords:
-
- Quantum size effect;
- metal film;
- chemical potential;
- work function;
- dielectric substrate;
- jellium model;
- Condensed Matter - Statistical Mechanics
- E-Print:
- 11 pages, 3 figures