Enhancement of bulk second-harmonic generation from silicon nitride films by material composition
Abstract
We present a comprehensive tensorial characterization of second-harmonic generation from silicon nitride films with varying composition. The samples were fabricated using plasma-enhanced chemical vapor deposition, and the material composition was varied by the reactive gas mixture in the process. We found a six-fold enhancement between the lowest and highest second-order susceptibility, with the highest value of approximately 5 pm/V from the most silicon-rich sample. Moreover, the optical losses were found to be sufficiently small (below 6 dB/cm) for applications. The tensorial results show that all samples retain in-plane isotropy independent of silicon content, highlighting the controllability of the fabrication process.
- Publication:
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Optics Letters
- Pub Date:
- December 2017
- DOI:
- 10.1364/OL.42.005030
- arXiv:
- arXiv:1708.02873
- Bibcode:
- 2017OptL...42.5030K
- Keywords:
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- Physics - Optics
- E-Print:
- 4 pages, 3 figures, 2 tables