Step bunching of vicinal 6H-SiC{0001} surfaces
Abstract
We use kinetic Monte Carlo simulations to understand growth-induced and etching-induced step bunching of 6H-SiC{0001} vicinal surfaces oriented toward ⟨11¯00⟩ and ⟨112¯0⟩ . By taking account of the different rates of surface diffusion on three inequivalent terraces, we reproduce the experimentally observed tendency for single bilayer height steps to bunch into half unit-cell height steps. By taking account of the different mobilities of steps with different structures, we reproduce the experimentally observed tendency for adjacent pairs of half unit-cell height steps to bunch into full unit-cell height steps. A prediction of our simulations is that growth-induced and etching-induced step bunching lead to different surface terminations for the exposed terraces when full unit-cell height steps are present.
- Publication:
-
Physical Review B
- Pub Date:
- June 2009
- DOI:
- 10.1103/PhysRevB.79.245413
- arXiv:
- arXiv:0903.2067
- Bibcode:
- 2009PhRvB..79x5413B
- Keywords:
-
- 81.10.Aj;
- 81.15.Kk;
- 81.65.Cf;
- Theory and models of crystal growth;
- physics of crystal growth crystal morphology and orientation;
- Vapor phase epitaxy;
- growth from vapor phase;
- Surface cleaning etching patterning;
- Condensed Matter - Materials Science
- E-Print:
- 10 pages, 12 figures