Kinetics of the low-pressure chemical vapor deposited tungsten nitride process using tungsten hexafluoride and ammonia precursors
Abstract
- Publication:
-
Journal of Vacuum Science Technology A: Vacuum Surfaces and Films
- Pub Date:
- December 2021
- DOI:
- 10.1116/6.0001093
- Bibcode:
- 2021JVSTA..39f3403H