Atomic layer etching of Si3N4 with high selectivity to SiO2 and poly-Si
Abstract
- Publication:
-
Journal of Vacuum Science Technology A: Vacuum Surfaces and Films
- Pub Date:
- September 2021
- DOI:
- 10.1116/6.0001179
- Bibcode:
- 2021JVSTA..39e2601M