We describe the formation of nested wrinkles created by the thermal mismatch between a narrow-band thin film and a compliant substrate. When a film is described as "narrow-band", it literally means that the film band width is much shorter than its length; more precisely, it means that the width is comparable with the wavelength of the wrinkles. A silicon mask was used during film sputtering to create narrow-band films on poly (dimethylsiloxane) substrate, thus creating regular boundaries to steer local stresses and control wrinkle morphology. Disordered nano-scale wrinkles were found nested within highly ordered micro-scale sinusoidal wrinkles. The formation of nested wrinkles was explained through the amplitude and wavelength saturation of nano-scale wrinkles. The disordered morphology of nano-scale wrinkles and the highly ordered morphology of micro-scale wrinkles were explained by using the boundary effect.