Design and characterization of GaN p-i-n diodes for betavoltaic devices
Abstract
The performance of gallium nitride (GaN) p-i-n diodes were investigated for use as a betavoltaic device. Dark IV measurements showed a turn on-voltage of approximately 3.2 V, specific-on-resistance of 15.1 mΩ cm2 and a reverse leakage current of -0.14 mA/cm2 at -10 V. A clear photo-response was observed when IV curves were measured under a light source at a wavelength of 310 nm (4.0 eV). In addition, GaN p-i-n diodes were tested under an electron-beam in order to simulate common beta radiation sources ranging from that of 3H (5.6 keV average) to 63Ni (17 keV average). From this data, we estimated output powers of 53 nW and 750 nW with overall efficiencies of 0.96% and 4.4% for our device at incident electron energies of 5.6 keV and 17 keV corresponding to 3H and 63Ni beta sources respectively.
- Publication:
-
Solid State Electronics
- Pub Date:
- October 2017
- DOI:
- 10.1016/j.sse.2017.06.010
- Bibcode:
- 2017SSEle.136...24K
- Keywords:
-
- Betavoltaic devices;
- GaN p-i-n diodes;
- Tritium;
- Nickel-63