Stable yttrium oxyfluoride used in plasma process chamber Shiba, Yoshinobu ; Teramoto, Akinobu ; Goto, Tetsuya ; Kishi, Yukio ; Shirai, Yasuyuki ; Sugawa, Shigetoshi Abstract Publication: Journal of Vacuum Science Technology A: Vacuum Surfaces and Films Pub Date: March 2017 DOI: 10.1116/1.4975143 Bibcode: 2017JVSTA..35b1405S