Effects of increased acoustic phonon deformation potential and surface roughness scattering on quasi-ballistic transport in ultrascaled Si-MOSFETs
It is a common view that ballistic transport is enhanced by channel length scaling because of a decreased scattering number. On the other hand, the acoustic phonon (AP) scattering rate is higher in silicon-on-insulator (SOI) MOSFETs than in bulk Si-MOSFETs; moreover, surface roughness (SR) scattering caused by spatial fluctuation of quantized subbands emerges in extremely scaled SOI channels. Therefore, the influences of these scattering mechanisms on ballistic transport in ultrathin-body Si-MOSFETs are examined in this paper using a Monte Carlo simulation technique. First of all, the effect of increased AP scattering rate on the drain current and ballistic efficiency is found to be negligible. Furthermore, contrary to the common view, ballistic transport in double-gate MOSFETs is shown to be degraded when the channel length decreases to less than 10 nm, mainly owing to SR scattering intensified by the spatial fluctuation of quantized subbands. The gate and drain bias voltage dependencies of ballistic efficiency are also discussed.