Reduction of anatase TiO2 on Si(111) by ion beam sputtering
Abstract
Titanium dioxide (TiO2) is deposited on Si(111) substrate by Pulsed Laser Deposition (PLD) technique and is investigated using Raman Spectroscopy and X-ray Photoelectron Spectroscopy (XPS) techniques. Raman Spectroscopy indicates that the as-deposited TiO2 film is in anatase phase. After sputtering in-situ in the XPS preparation chamber, TiO2 is reduced to TiO and Ti metal, and the reduction is more prominent in the top layers of the film.
- Publication:
-
Functional Materials
- Pub Date:
- July 2012
- DOI:
- 10.1063/1.4736930
- Bibcode:
- 2012AIPC.1461..403M
- Keywords:
-
- ion beam effects;
- Raman spectra;
- reduction (chemical);
- sputter deposition