Fabrication and characterization of analyzer gratings with high aspect ratios for phase contrast imaging using a Talbot interferometer
In recent years, X-ray imaging based on the differential phase contrast gained more and more attention to be used in X-ray imaging. Among other techniques like crystal-based diffraction and propagation methods, the grating based Talbot interferometry offers an approach measuring phase modulations of X-rays while passing low absorbing objects. The Talbot interferometer yields for highly efficient X-ray imaging signals for hard X-rays with energies above 10 keV. One factor with high impact on the imaging performance of such grating interferometers is the gratings quality. We introduce a fabrication process allowing both, the fabrication of phase modulating and analyzer gratings with high aspect ratios, up to 100. Structural deviations from the optimal geometry of the gratings are investigated and their influence on the obtained image quality is discussed.