Rapid turnaround scanning probe nanolithography
Abstract
Scanning probe nanolithography (SPL) has demonstrated its potential in a variety of applications like 3D nanopatterning, 'direct development' lithography, dip-pen deposition or patterning of self-assembled monolayers. One of the main issues holding back SPL has been the limited throughput for patterning and imaging. Here we present a complete lithography and metrology system based on thermomechanical writing into organic resists. Metrology is carried out using a thermoelectric topography sensing method. More specifically, we demonstrate a system with a patterning pixel clock of 500 kHz, 20 mm s - 1 linear scan speed, a positioning accuracy of 10 nm, a read-back frequency bandwidth of 100 000 line-pairs s - 1 and a turnaround time from patterning to qualifying metrology of 1 min. Thus, we demonstrate a nanolithography system capable of implementing rapid turnaround.
- Publication:
-
Nanotechnology
- Pub Date:
- July 2011
- DOI:
- 10.1088/0957-4484/22/27/275306
- Bibcode:
- 2011Nanot..22A5306P