Multilayer-Based Optics for High-Brightness X-ray Sources
Abstract
High-brightness x-ray sources, such as next-generation synchrotrons and free-electron lasers (FELs), pose unique challenges for the development of x-ray optics. The peak intensities of FEL pulses can be high enough to convert any material placed in a focused beam into plasma. X-ray optics, which are used close to the focal spot, are likely to be partially or completely damaged in a single shot. Such optics would need to be replenished after each shot. Optics that are used in the unfocused or indirect beam may survive much longer, perhaps indefinitely, if care is used to limit the energy absorbed in the optics. Here we present different types of multilayer-based optics, which were used successfully in FEL experiments for reflecting, focusing, and filtering high-intensity, pulsed x-rays in a variety of novel science applications.
- Publication:
-
10th International Conference on X-ray Microscopy
- Pub Date:
- September 2011
- DOI:
- 10.1063/1.3625301
- Bibcode:
- 2011AIPC.1365...46B
- Keywords:
-
- multilayers;
- X-ray optics;
- free electron lasers;
- X-ray diffraction;
- 78.67.Pt;
- 41.50.+h;
- 41.60.Cr;
- 61.05.cp;
- Multilayers;
- superlattices;
- X-ray beams and x-ray optics;
- Free-electron lasers;
- X-ray diffraction