100 MeV Ag Ion Irradiation Induced Structural and Optical Modifications in PLD Grown Tin Oxide Thin Films
Abstract
Tin oxide thin films were deposited by pulsed laser deposition (PLD) technique on quartz and Si substrates. The as-deposited films were irradiated using 100 MeV Ag ions at different fluencies. The as-deposited and irradiated films have been characterized using XRD and UV-Vis techniques to study the changes in structural and optical properties. Crystallinity has decreased and band gap has increased from 3.92 eV to 4.24 eV as indicated by XRD and UV-Vis spectroscopy.
- Publication:
-
Solid State Physics
- Pub Date:
- July 2011
- DOI:
- 10.1063/1.3606075
- Bibcode:
- 2011AIPC.1349..749K
- Keywords:
-
- pulsed laser deposition;
- optical properties;
- X-ray diffraction;
- electrical conductivity;
- 81.15.Fg;
- 78.20.Bh;
- 61.05.cp;
- 84.37.+q;
- Laser deposition;
- Theory models and numerical simulation;
- X-ray diffraction;
- Measurements in electric variables