Optical lithography: Lithography at EUV wavelengths
Abstract
Extreme-ultraviolet (EUV) lithography at 13.5 nm is expected to be introduced in high-volume semiconductor chip production over the next three years. Research is now underway to investigate sub-10-nm light sources that could support lithography over the coming decades.
- Publication:
-
Nature Photonics
- Pub Date:
- December 2010
- DOI:
- 10.1038/nphoton.2010.277
- Bibcode:
- 2010NaPho...4..809T