Sub-10-nm half-pitch electron-beam lithography by using poly(methyl methacrylate) as a negative resist
Abstract
- Publication:
-
Journal of Vacuum Science Technology B: Microelectronics and Nanometer Structures
- Pub Date:
- November 2010
- DOI:
- 10.1116/1.3501353
- Bibcode:
- 2010JVSTB..28C..58D