Influence of Glacial Acetic Acid and Nitric Acid as a Chelating Agent in Sol-gel Process to the Nanostructured Titanium Dioxide Thin Films
The comparison between different chelating agents in sol-gel process for deposition of nanostructured Titanium Dioxide (TiO2) thin film has been studied. Glacial Acetic Acid (GA) and Nitric Acid (NA) were used in 0.2 M of concentration. The effects to the structural, electrical and optical properties have been studied. The effects of these properties were characterized using X-Ray Diffractometer (XRD), 2-point probe I-V measurement and UV-Vis-NIR Spectrophotometer. For electrical properties, it showed that nanostructured TiO2 thin film that using GA (TF-GA) as chelating agent gives better low sheet resistance compare to nanostructured TiO2 thin film using NA (TF-NA). From XRD results, it indicates that no significantly different between both TiO2 thin film. Both of thin films have crystalline anatase phase at 2θ degree 25.8° which corresponded to (101) orientation. For optical properties, sol-gel using GA has slightly higher in transmittance spectra properties but both of films fully absorbed UV light at 300 nm of wavelength. As for optical band gap, both sol-gels using GA and NA has similar optical band gap which is 3.27 eV.
Nanoscience and Nanotechnology: International Conference on Nanoscience and Nanotechnology - 2008
- Pub Date:
- June 2009
- Optical properties of low-dimensional mesoscopic and nanoscale materials and structures;
- Sol-gel processing precipitation;
- Optical and dielectric properties