Breakdown spots propagation in ultra-thin SiO2 films under repetitive ramped voltage stress using conductive atomic force microscopy
Abstract
- Publication:
-
Journal of Physics and Chemistry of Solids
- Pub Date:
- February 2008
- DOI:
- 10.1016/j.jpcs.2007.07.077
- Bibcode:
- 2008JPCS...69..470W