Highly Versatile and Robust Materials for Soft Imprint Lithography Based on Thiol-ene Click Chemistry Campos, Luis M. ; Meinel, Ines ; Guino, Rosette G. ; Schierhorn, Martin ; Gupta, Nalini ; Stucky, Galen D. ; Hawker, Craig J. Abstract Publication: Advanced Materials Pub Date: October 2008 DOI: 10.1002/adma.200800330 Bibcode: 2008AdM....20.3728C