Low sidewall damage plasma etching using ICP-RIE with HBr chemistry of Si/SiGe resonant interband tunnel diodes Park, S. -Y. ; Chung, S. -Y. ; Berger, P. R. ; Yu, R. ; Thompson, P. E. Abstract Publication: Electronics Letters Pub Date: 2006 DOI: 10.1049/el:20060323 Bibcode: 2006ElL....42..719P