Micropore x-ray optics using anisotropic wet etching of (110) silicon wafers
Abstract
To develop x-ray mirrors for micropore optics, smooth silicon (111) sidewalls obtained after anisotropic wet etching of a silicon (110) wafer were studied. A sample device with 19 μm wide (111) sidewalls was fabricated using a 220 μm thick silicon (110) wafer and potassium hydroxide solution. For what we believe to be the first time, x-ray reflection on the (111) sidewalls was detected in the angular response measurement. Compared to ray-tracing simulations, the surface roughness of the sidewalls was estimated to be 3-5 nm, which is consistent with the atomic force microscope and the surface profiler measurements.
- Publication:
-
Applied Optics
- Pub Date:
- December 2006
- DOI:
- 10.1364/AO.45.008932
- Bibcode:
- 2006ApOpt..45.8932E
- Keywords:
-
- Medical optics instrumentation;
- Microstructure fabrication;
- X-ray mirrors;
- Astronomical optics