Gold film with gold nitride—A conductor but harder than gold
Abstract
The formation of surface nitrides on gold films is a particularly attractive proposition, addressing the need to produce harder, but still conductive, gold coatings which reduce wear but avoid the pollution associated with conventional additives. Here we report production of large area gold nitride films on silicon substrates, using reactive ion sputtering and plasma etching, without the need for ultrahigh vacuum. Nanoindentation data show that gold nitride films have a hardness ∼50% greater than that of pure gold. These results are important for large-scale applications of gold nitride in coatings and electronics.
- Publication:
-
Applied Physics Letters
- Pub Date:
- May 2005
- DOI:
- 10.1063/1.1941471
- Bibcode:
- 2005ApPhL..86v1912S
- Keywords:
-
- 62.20.Qp;
- 81.05.Bx;
- 81.65.-b;
- 79.60.-i;
- 79.60.Dp;
- 81.15.Cd;
- 61.50.Ah;
- Tribology and hardness;
- Metals semimetals and alloys;
- Surface treatments;
- Photoemission and photoelectron spectra;
- Adsorbed layers and thin films;
- Deposition by sputtering;
- Theory of crystal structure crystal symmetry;
- calculations and modeling