Guiding and confining light in void nanostructure
Abstract
We present a novel waveguide geometry for enhancing and confining light in a nanometer-wide low-index material. Light enhancement and confinement is caused by large discontinuity of the electric field at high-index-contrast interfaces. We show that by use of such a structure the field can be confined in a 50-nm-wide low-index region with a normalized intensity of 20 µm^-2. This intensity is approximately 20 times higher than what can be achieved in SiO2 with conventional rectangular waveguides.
- Publication:
-
Optics Letters
- Pub Date:
- June 2004
- DOI:
- 10.1364/OL.29.001209
- Bibcode:
- 2004OptL...29.1209A
- Keywords:
-
- integrated optics;
- optical waveguides