Silicon Etch Rate Using Chlorine Trifluoride Habuka, Hitoshi ; Sukenobu, Takahiro ; Koda, Hideyuki ; Takeuchi, Takashi ; Aihara, Masahiko Abstract Publication: Journal of the Electrochemical Society Pub Date: November 2004 DOI: 10.1149/1.1806391 Bibcode: 2004JElS..151G.783H