Reactive Ion Etching of SiC and SiCN using Tetrafluoroethane and Oxygen
Abstract
Available from http://www.aps.org/meet/TSF04/baps/abs/S60020.html
- Publication:
-
APS Texas Sections Fall Meeting Abstracts
- Pub Date:
- October 2004
- Bibcode:
- 2004APS..TSF.A4020M