Height fluctuations and intermittency of V_{2}O_{5} films by atomic force microscopy
Abstract
The spatial scaling law and intermittency of the V_{2}O_{5} surface roughness has been investigated by atomic force microscopy. The intermittency of the height fluctuations has been checked by two different methods, first, by measuring the scaling exponent of the q th moment of heightdifference fluctuations i.e. C_{q} = langleh(x_{1})  h(x_{2})^{q} rangle, and second, by defining the generating function Z(q, N) and generalized multifractal dimension D_{q}. These methods predict that there is no intermittency in the height fluctuations. The observed roughness and dynamical exponents can be explained by numerical simulation on the basis of the forced Kuramoto Sivashinsky equation.
 Publication:

Journal of Physics Condensed Matter
 Pub Date:
 April 2003
 DOI:
 10.1088/09538984/15/12/306
 arXiv:
 arXiv:condmat/0306035
 Bibcode:
 2003JPCM...15.1889Z
 Keywords:

 Condensed Matter  Statistical Mechanics
 EPrint:
 6 pages (two columns), 11 eps. figures, latex