Temperature dependence of the Seebeck coefficient and the potential barrier scattering of n-type PbTe films prepared on heated glass substrates by rf sputtering
Abstract
Thermoelectric properties of polycrystalline degenerate n-type PbTe films have been investigated in order to understand potential barrier scattering. The Seebeck coefficients of the PbTe films obtained in this study were larger than those of bulk samples having the same carrier concentrations in the temperature range from 100 to 450 K. Some of their power factors were larger than those of bulk samples having the same carrier concentrations in the temperature range from 200 to 450 K, while their electrical conductivities were smaller than those of bulk samples. From a comparison of these results with those previously reported, we concluded that potential barrier scattering occurred at grain boundaries in our films, resulting in the above favorable changes in thermoelectric properties. By analyzing their properties using the energy filtering model, we estimated the height of grain-boundary potential barriers, which probably influenced the increases in the Seebeck coefficient. We also examined the origin of the potential barriers accordingly. Consequently, we consider that the origin of the potential barriers was mainly due to point defects, probably Te vacancies, and that the barrier height may be controlled, for example, by the preparation conditions.
- Publication:
-
Journal of Applied Physics
- Pub Date:
- November 2002
- DOI:
- 10.1063/1.1512964
- Bibcode:
- 2002JAP....92.5331K
- Keywords:
-
- Carrier Density (Solid State);
- Coatings;
- Electrical Resistivity;
- Lead Compounds;
- Lead Tellurides;
- Radio Frequencies;
- Seebeck Effect;
- Semiconductors (Materials);
- Sputtering;
- Temperature Dependence;
- Thermoelectricity;
- Thin Films;
- Transport Properties;
- 73.50.Lw;
- 73.61.Le;
- 81.15.Cd;
- 68.55.Ln;
- Solid-State Physics;
- Thermoelectric effects;
- Other inorganic semiconductors;
- Deposition by sputtering;
- Defects and impurities: doping implantation distribution concentration etc.