Comment on ``Atomic Transport and Chemical Stability during Annealing of Ultrathin Al2O3 Films on Si''
Abstract
A Comment on the Letter by C. Krug et al., Phys. Rev. Lett. 85, 4120 (2000). The authors of the Letter offer a Reply.
- Publication:
-
Physical Review Letters
- Pub Date:
- May 2001
- DOI:
- 10.1103/PhysRevLett.86.4713
- Bibcode:
- 2001PhRvL..86.4713C