Tin Doping of Silicon for Controlling Oxygen Precipitation and Radiation Hardness Claeys, C. ; Simoen, E. ; Neimash, V. B. ; Kraitchinskii, A. ; Kras'ko, M. ; Puzenko, O. ; Blondeel, A. ; Clauws, P. Abstract Publication: Journal of the Electrochemical Society Pub Date: December 2001 DOI: 10.1149/1.1417558 Bibcode: 2001JElS..148G.738C