Reflection High-Energy Electron Diffraction and 119SN MÖSSBAUER Investigation of Epitaxial α-SN Films

Structure and growth of epitaxial Sn films on InSb(001), Cu(001) and fcc-Fe/Cu(001) substrates were investigated by reflection high-energy electron diffraction (RHEED) and ¹¹⁹Sn Mössbauer spectroscopy. The Sn films grow epitaxially in the α-Sn(001) phase up to 1100 Å thickness on InSb, up to 5.5 ML on Cu(001), and up to 2.7 ML on fcc-Fe/Cu(001). Various surface reconstructions as a function of Sn coverage have been observed. The in-plane lattice parameter of the α-Sn overlayer was studied as a function of coverage.