Stereolithography with XeCl excimer laser/lamp
Abstract
For the stereo-lithography, XeCl excimer laser has been adapted to improve the utilization efficiency of laser energy. Because of the beam uniformity was made better by a homogenizer, the quantity of cured resin per laser energy was increased compare than that without the homogenizer. With this method a simple 3D object was created, and its was proved that XeCl excimer laser was possible to apply for the stereo- lithography.
- Publication:
-
High-Power Lasers in Manufacturing
- Pub Date:
- February 2000
- DOI:
- 10.1117/12.377028
- Bibcode:
- 2000SPIE.3888..264S