Phase segregation of PS and PMMA blend under confinement
Abstract
We have studied the phase segregation of a PS (Mw=62k) and PMMA (Mw=25k) blend under confinement suing AFM and STXM. The results show that phase segregation is severely hindered by confinement. Uniform cylindrical structures with a very small wavelength form rapidly and appear to be stable even after long annealing times. These cylinders are oriented perpendicular to the Si substrate and appear to originate from a thin adsorbed uniform layer of PMMA which coats the Si interfaces. Addition of 10% diblock copolymer decreases the wavelength even further, but otherwise does not change the structure of dynamics. Detailed studies of partially confined transition regions indicate that the confined films may be under large elastic tension leading to the observed morphologies.
- Publication:
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APS March Meeting Abstracts
- Pub Date:
- March 2000
- Bibcode:
- 2000APS..MARK22004S