Fabrication of 200 nm period nanomagnet arrays using interference lithography and a negative resist
Abstract
- Publication:
-
Journal of Vacuum Science Technology B: Microelectronics and Nanometer Structures
- Pub Date:
- November 1999
- DOI:
- 10.1116/1.590976
- Bibcode:
- 1999JVSTB..17.3182F