Reaction and thermal stability of cobalt disilicide on polysilicon resulting from a Si/Ti/Co multilayer system
Abstract
- Publication:
-
Journal of Vacuum Science Technology B: Microelectronics and Nanometer Structures
- Pub Date:
- July 1999
- DOI:
- 10.1116/1.590773
- Bibcode:
- 1999JVSTB..17.1448A