Multilevel diffractive elements in SiO2 by electron beam lithography and proportional etching with analogue negative resist - NASA/ADS

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NASA/ADS

Multilevel diffractive elements in SiO2 by electron beam lithography and proportional etching with analogue negative resist

Publication:: Journal of Modern Optics
Pub Date:: August 1999
DOI:: 10.1080/09500349908231336
Bibcode:: 1999JMOp...46.1295L

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