Using kinetic Monte-Carlo simulations of a solid-on-solid model we investigate the influence of step edge diffusion (SED) and evaporation on molecular beam epitaxy (MBE). Based on these investigations we propose two strategies to optimize MBE-growth. The strategies are applicable in different growth regimes: during layer-by-layer growth one can reduce the desorption rate using a pulsed flux. In three-dimensional (3D) growth the SED can help to grow large, smooth structures. For this purpose the flux has to be reduced with time according to a power law.