Electron Energy Deposition in a Gas Mixture of Atomic and Molecular Hydrogen and Helium
Abstract
A detailed discussion is presented of the slowing down of fast electrons in a partly ionized gas mixture of H, H2, and He with a varying ratio of H to H2 and a fixed fraction of He. The mean energies and yields for ionization, electronic excitation, dissociation, and vibrational excitation and the heating efficiencies are calculated for fractional ionizations from 0 to 0.1. Analytical formulas are obtained for many of the parameters.
- Publication:
-
The Astrophysical Journal Supplement Series
- Pub Date:
- November 1999
- DOI:
- 10.1086/313267
- Bibcode:
- 1999ApJS..125..237D
- Keywords:
-
- ATOMIC PROCESSES;
- ISM: ABUNDANCES;
- ISM: MOLECULES;
- X-RAYS: GENERAL;
- Atomic Processes;
- ISM: Abundances;
- ISM: Molecules;
- X-Rays: General