Influence of Oxygen Pressure on the Structural and Optical Properties of DC Magnetron Reactive Sputtered Cadmium Oxide Films
Abstract
Cadmium oxide thin films were prepared onto glass substrates by a DC magnetron reactive sputtering method from a metallic cadmium target in an argon and oxygen atmosphere. A systematic study has been made on the influence of oxygen partial pressure, ranging from 2 × 10-4mbar to 5 × 10-3mbar, on the film structure and optical properties. The films were polycrystalline in nature with cubic structure. The grain size of the films was in the range 40-80nm. The optical transmittance of the films was in the range 65-85% in the wavelength region 600-1600nm. The optical band gap and refractive index of the films increased from 2.46eV to 2.54eV and 2.33 to 2.42 with increase in the partial pressure of oxygen ranging from 5 × 10-4mbar to 5 × 10-3mbar respectively.
- Publication:
-
Physica Scripta
- Pub Date:
- February 1998
- DOI:
- 10.1088/0031-8949/57/2/032
- Bibcode:
- 1998PhyS...57..317S