Application of genetic algorithms for characterization of thin layered materials by glancing incidence X-ray reflectometry
Abstract
A genetic algorithm for characterization of thin-layered materials by glancing incidence X-ray reflectometry is proposed. For both simulated and measured data good fits are obtained within a single run. This reduces the amount of human effort and expertise necessary for analyzing reflectivity measurements which makes genetic algorithms an attractive alternative to methods currently used.
- Publication:
-
Physica B Condensed Matter
- Pub Date:
- October 1998
- DOI:
- 10.1016/S0921-4526(98)00398-6
- Bibcode:
- 1998PhyB..253..254D