Control of sputtering in a modified magnetron-typed radio-frequency discharge

In a modified magnetron-typed radio-frequency (RF) discharge plasma, the sheath potential in front of the RF electrode is controlled by varying the magnetic field configuration and strength around the RF electrode, which gives rise to a big change of particle sputtering from the RF electrode. The relation between the RF electrode potential and the plasma potential is quite different from that in the conventional capacitively coupled RF discharges, being responsible for a drastic decrease in the sputtering.