Optimization of an electron cyclotron resonance etch process using full wafer charge coupled device interferometry Pendharkar, S. V. ; Resnick, D. J. ; Dauksher, W. J. ; Cummings, K. D. ; Tepermeister, I. ; Conner, W. T. Abstract Publication: Journal of Vacuum Science Technology Pub Date: May 1997 Bibcode: 1997JVST...15..816P